PVA Nodular Brush for Wafer and Semiconductor

PVA Brush(nodular roller)

PVA Nodular Brush used on semiconductor industry which requires high wafer cleanliness removing the contaminant on the Wafer or semiconductor surface. PVA Brush Roller can designed and made to different shape to meet different machine requirement.

The main functions of the PVA wafer brushing process include:

1. Cleaning sponge brush: The PVA Wafer Brush can effectively remove impurities, dust and pollutants from the wafer surface to ensure the cleanliness of the wafer surface.

2. Remove mask residue: During the lithography process, some dust or other substances remain, and the PVA wafer brush can help remove these residues to ensure the accuracy and reliability for lithography process.

3. Increase roughness: In some processes, it is needs a certain roughness on the wafer surface, and PVA wafer brush can increase the roughness of the wafer surface by brushing to meet specific process requirements.

4. Improve adhesion: The PVA nodular brush can form a small concave and convex structure on the wafer surface, thereby increasing the contact area between the wafer surface and other materials, improving adhesion, which is conducive to the subsequent process.

What's the flow of making PVA brush:

Customer provide drawing--->our factory evaluate the drawing and quote--->opening mould---->start production.